Oxford Instruments Plasma Technology

Oxford Instruments Plasma Technology offers flexible, configurable process tools and leading-edge processes for the precise, controllable and repeatable engineering of micro- and nano-structures. Our systems provide process solutions for nanometre layer epitaxial growth of compound semiconductor material, etching of nanometre sized features and the controlled growth of nanostructures. These solutions are based on core technologies in plasma-enhanced deposition and etch, ion-beam deposition and etch, atomic layer deposition and hydride vapour phase epitaxy. Products range from compact stand-alone systems for R&D, through batch tools and up to clustered cassette-to-cassette platforms for high-throughput production processing.

Markets: Display and Lighting, Semiconductor Electronics, Energy, MEMS & Niche and Emerging markets

Technologies: Plasma Etch and Deposition, Atomic Layer Deposition (ALD), Ion Beam Etch and Deposition, Nanoscale Growth Systems & Hydride Vapour Phase Epitaxy (HVPE)