Contact

Prof. Dr. Wolfgang Benecke

Address

Fraunhoferstrasse 1

Itzehoe , D-25524 Germany

Phone

+49 (0) 48 21 / 17 - 4210

Fax

+49 (0) 48 21 / 17 - 42 50

Website

www.isit.fraunhofer.de

 

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Fraunhofer ISIT

Advanced Materials, Equipment, Foundry Services, MEMS Devices, Other, Professional Services, Software

Fraunhofer ISIT in Itzehoe is one of Europe's most modern research facilities for microelectronics and microsystems technology. The heart of the institute is the 3,000 m² cleanroom, big enough to operate not only research projects but also to produce the developed microchips in industrial scale. 150 scientists develop at ISIT in close cooperation with industrial partners power electronic components and microsystems, with fine movable structures for sensors (pressure, movement, biochemical analysis, etc.) and actuators (valves, scanners, micromirrors etc.) including the necessary electronics. These miniaturized components are used in medicine, in the environment - and traffic engineering, communication technology, automotive industry and mechanical engineering.

Mems Marketplace
Advanced Materials
Equipment
Batch develop
Chemical Vapor Deposition Systems
Chemical Vapour Etching (CVE)
Cleaning
Coat Develop and Expose
Coating
Deep Reactive Ion Etching (DRIE) Systems
Deep Silicon Etch Systems
Dry Etch Release
Electroetching
Electroplating
Lithography
Manual Wet Bench
Mask Aligner
Mask and Bonder Aligners
Metal Lift Off
Metrology Instrumentation
Packaging
Physical Vapor Deposition (PVD) Systems
Plasma Enhanced Chemical Vapour Deposition (PECVD)
Plasma Etching Systems
Semi Automated Wet Processing System
Stripping
Testing
Wafer Bonding
Wet etching
Foundry Services
Design
Feasability
Low Volume Fabrication
Manufacturing Services
Mask Layout
Metal Via
Modeling
Packaging
Pilot Services
Process Development
Prototyping
Research & Development
Silicon Deep Reactive Ion Etch (RIE)
Technology Transfer to Foundry
Through Silicon Via
Wafer Bonding
MEMS Devices
Other
Professional Services
Software
Simulation tools