Veeco

Veeco’s suite of Ion Beam Etch (IBE) and Physical Vapor Deposition (PVD) equipment meets the critical challenges of next generation MEMS and sensor devices by providing precise control of complex thin film layer structures that result in smaller form factors and integrated combination devices. Our systems offer significant advantages over competing technologies such as Reactive Ion Etching (RIE) in piezoelectric, ferroelectric and other applications.