Vapor Phase Process

SVR - Xe for isotropic etching of silicon, molybdenum, tungsten SVR - vHF for isotropic etching of silicon dioxide SPD for deposition of self assembled monolayers such as anti-stiction coatings

Categories: Equipment > Chemical Vapor Deposition Systems | Chemical Vapour Etching (CVE) | Dry Etch Release | Molecular Vapor Deposition (MVD®) |
Manufacturer: memsstar
Model: