PlasmaPro® Estrelas100

PlasmaPro® Estrelas100

With the R&D market in mind, PlasmaPro® Estrelas100 offers the ultimate in process flexibility. Nano and micro structures can be realised as the hardware has been designed with the ability to run BoschTM and cryo etch technologies in the same chamber. From smooth sidewall processes to high etch rate processes, the PlasmaPro® Estrelas100 has been developed ensuring that the variety of MEMS applications can be achieved without the need to change the chamber hardware.

Categories: Equipment > Etch Mask | Silicon Deep Reactive Ion Etch (RIE) |
Manufacturer: Oxford Instruments Plasma Technology
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