Exposure simulates the physical phenomenon and chemical reaction of SU-8 photoresists during the exposure, PEB, and development process which are the focuses of UV lithography modeling.
It includes all steps of UV lithography modeling: A. Inclined light intensity distribution modeling B. Exposure modeling C. PEB modeling D. Development modeling It can predict the developed profiles of SU-8 photoresists. Also, it can analyze the intensity distribution impact on the developed profile of SU-8 photoresists.