NXQ8000 Series Mask Aligner
• The NXQ8000 Series Mask Aligner is a 1x Full Field Photo-lithography system. It combines ‘open architecture’ modular design with precision alignment and exposure features. It supports vacuum, contact and proximity printing modes and handles partial and whole substrates up to 200mm (8”) diameter. • The versatility of the NXQ8000 has made it the choice of manufacturing facilities, R&D Centers and University programs around the world, for a wide range of technologies. • Scalable from R&D to HVM by adding Robot Upgrade; same process recipes from R&D to HVM.