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SPTS Technologies: SPTS XeF2 Vapor Release Etch
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XACTIX® XeF2 etch systems


Isotropic etching of silicon using xenon difluoride is an ideal solution for releasing MEMS devices. XeF2 shows high selectivity to silicon over almost all standard semiconductor materials including photoresist, silicon dioxide, silicon nitride and aluminum. Being a vapor phase etchant, XeF2 avoids many of the problems typically associated with wet or plasma etch processes.  

SPTS offers the following Xactix┬« xenon difluoride etching systems:

  • e2 - low cost, table-top R&D xenon difluoride etching system
  • X4 - for applications from intensive R&D to pilot production
  • CVE - designed to fit on the SPTS cluster platforms allowing the integration of multiple XeF2 modules with the full line of modules available from SPTS.
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